plasma enhance chemical vapor deposition meaning in Chinese
电浆增强式化学气相沉积法
Examples
- Magnetic - field - aided plasma enhanced chemical vapor deposition
磁场辅助等离子体增强化学气相沉积 - Among the manufacture processes , this thesis focuses on the deposition of silica waveguidi film with a plasma enhanced chemical vapor deposition ( pecvd )
最后本文实现了器件样品的制作。器件制作的工艺流程中本文重点研究了基于半导体技术的二氧化硅薄膜沉积技术。 - In this investigation , gas barrier property of pet has been improved by plasma enhanced chemical vapor deposition ( pecvd ) and plasma immersion ion implantation ( piii ) technologies
本文通过等离子体化学气相沉积( pecvd )和等离体浸没离子注入( piii )技术在聚酯材料表面制备了阻隔碳膜来提高气体阻隔性能。 - Without using the doping of ge , plasma enhanced chemical vapor deposition ( pecvd ) of thick silica films on si substrates with gas mixtures of sih4 and n2o has been investigated
实验以硅烷和氧化二氮作为反应气体，采用等离子体增强化学气相沉积( pecvd )技术，在单晶硅衬底上制备了用于平面光波导的二氧化硅薄膜。 - ( 2 ) diamond - like carbon films could be fabricated by plasma enhanced chemical vapor deposition method too , the surface morphology of the films was good , but the films had very big internal stress , which could be decreased by adding proper nitrogen gas in work chamber
( 2 )用等离子体增强化学气象沉积技术也能制备类金刚石膜。优点是用这种方法制备的薄膜表面形貌得到了一定的改善，但内应力较大，通过加入适量的氮气可以改善一些。